Growth of SiC Films using Tetraethylsilane

Materials Science Forum 2004 Vol. 457-460

Growth of SiC Films using Tetraethylsilane

Kubo, N., Kawase, Tadahiro, Asahina, S., Kanayama, Nobuyuki, Tsuda, H., Moritani, A., Kitahara, Koichi
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Volume:
457-460
Year:
2004
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.457-460.269
File:
PDF, 345 KB
english, 2004
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