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Amorphous Silicon Carbide Film Formation at Room Temperature by Monomethylsilane Gas
Habuka, Hitoshi, Tsuji, Masaki, Ando, YusukeVolume:
740-742
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.740-742.235
Date:
January, 2013
File:
PDF, 2.50 MB
english, 2013