![](/img/cover-not-exists.png)
Chemical–mechanical polishing of copper and tantalum with silica abrasives
Li, Y., Hariharaputhiran, M., Babu, S. V.Volume:
16
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/JMR.2001.0148
Date:
April, 2001
File:
PDF, 217 KB
english, 2001