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Uniformity and Quality of Monocrystalline Silicon Passivation by Thin Intrinsic Amorphous Silicon in a New Generation Plasma-enhanced Chemical Vapor Deposition Reactor
Strahm, Benjamin, Andrault, Yoann, Bäetzner, Derk, Lachenal, Damien, Guérin, Chloé, Kobas, Manuela, Mai, Joachim, Mendes, Bruno, Schulze, Thomas, Wahli, Guillaume, Buechel, ArthurVolume:
1245
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-1245-a01-04
Date:
January, 2010
File:
PDF, 214 KB
english, 2010