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Characterization of Aluminium Titanium Nitride Thin Films Deposited by Reactive Magnetron Co-Sputtering
Buranawong, Adisorn, Chaiyakhun, Surasing, Limsuwan, PichetVolume:
93-94
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/amr.93-94.340
Date:
January, 2010
File:
PDF, 537 KB
english, 2010