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The Development of Resistive Heating for the High Temperature Growth of α-SiC using a Vertical CVD Reactor
Eshun, Ebenezer, Taylor, Crawford, Diagne, N.Fama, Spencer, Michael G., Ferguson, Ian T., Gurary, Alex, Stall, RickVolume:
338-342
Year:
2000
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.338-342.157
File:
PDF, 299 KB
2000