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Epitaxial Growth of 4H-SiC with High Growth Rate Using CH3Cl and SiCl4 Chlorinated Growth Precursors
Kotamraju, Siva Prasad, Krishnan, Bharat, Koshka, YaroslavVolume:
645-648
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.645-648.103
Date:
April, 2010
File:
PDF, 511 KB
english, 2010