Novel Design of MOCVD Reactor with Three Radial Inward...

Advanced Materials Research 2011 / 8 Vol. 308-310

Novel Design of MOCVD Reactor with Three Radial Inward Flows for Epitaxial Growth of GaN Thin Films

Yang, Liao Qiao, Hu, Jian Zheng, Chen, Zun Miao, Zhang, Jian Hua, Li, Alan G.
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Volume:
308-310
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.308-310.1037
Date:
August, 2011
File:
PDF, 1.08 MB
english, 2011
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