Relaxation Behavior and Breakdown Mechanisms of...

MRS Proceedings 2008 / 1 Vol. 1071

Relaxation Behavior and Breakdown Mechanisms of Nanocrystals Embedded Zr-doped HfO2 High-k Thin Films for Nonvolatile Memories

Yang, Chia-Han, Kuo, Yue, Lin, Chen-Han, Wan, Rui, Kuo, Way
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Volume:
1071
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1071-F02-09
Date:
January, 2008
File:
PDF, 621 KB
english, 2008
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