High Growth Rate in Atomic Layer Deposition of TiO2 thin...

High Growth Rate in Atomic Layer Deposition of TiO2 thin films by UV Irradiation

Kim, Seong Keun, Hoffmann-Eifert, Susanne, Waser, Rainer
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Volume:
14
Year:
2011
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.3534833
File:
PDF, 1.12 MB
english, 2011
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