Analyses of Diamond Disk Substrate Wear and Diamond Microwear in Copper Chemical Mechanical Planarization Process
Meled, Anand, Zhuang, Yun, Wei, Xiaomin, Cheng, Jiang, Sampurno, Yasa Adi, Borucki, Leonard, Moinpour, Mansour, Hooper, Don, Philipossian, AraVolume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3273077
File:
PDF, 985 KB
english, 2010