Complex impedance spectroscopy of high-k HfO2thin films in Al/HfO2/Si capacitor for gate oxide applications
Nath, Madhuchhanda, Roy, AsimVolume:
26
Language:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-015-2862-1
Date:
June, 2015
File:
PDF, 745 KB
english, 2015