On the Impact of Nanotopography of Silicon Wafers on Post-Chemical Mechanical Polished Oxide Layers
Schmolke, R., Deters, R., Thieme, P., Pech, R., Schwenk, H., Diakourakis, G.Volume:
149
Year:
2002
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1453410
File:
PDF, 908 KB
english, 2002