Comparison of Dielectric Characteristics of Ta[sub 2]O[sub 5] Thin Films on RuO[sub 2] and Ru Bottom Electrodes
Huang, J. H., Lai, Yi-Sheng, Chen, J. S.Volume:
148
Year:
2001
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1374218
File:
PDF, 264 KB
english, 2001