A Comparison of Thickness Values for Very Thin SiO[sub 2] Films by Using Ellipsometric, Capacitance-Voltage, and HRTEM Measurements
Ehrstein, James, Richter, Curt, Chandler-Horowitz, Deane, Vogel, Eric, Young, Chadwin, Shah, Shweta, Maher, Dennis, Foran, Brendan, Hung, P. Y., Diebold, AlainVolume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2133710
File:
PDF, 857 KB
english, 2006