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[ECS 216th ECS Meeting - Vienna, Austria (October 4 - October 9, 2009)] ECS Transactions - Characterization of High-Rate Deposited Microcrystalline Si Films Prepared using Atmospheric-Pressure Very High-Frequency Plasma
Tabuchi, Keita, Ouchi, Kentato, Ohmi, Hiromasa, Kakiuchi, Hiroaki, Yasutake, KiyoshiYear:
2009
Language:
english
DOI:
10.1149/1.3207619
File:
PDF, 270 KB
english, 2009