The Effect of Forward Gate Bias Stress on the Noise Performance of Mesa Isolated GaN HEMTs
Axelsson, Olle, Thorsell, Mattias, Andersson, Kristoffer, Rorsman, NiklasVolume:
15
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2014.2372474
Date:
March, 2015
File:
PDF, 1.32 MB
english, 2015