Structure and Epitaxial Behavior of Rutile TiO2 Thin Films...

Key Engineering Materials 2014 / 4 Vol. 605

Structure and Epitaxial Behavior of Rutile TiO2 Thin Films Prepared by DC Magnetron Sputtering and Ex-Situ Annealing

Roch, Tomas, Durina, Pavol, Truchly, Martin, Plecenik, Tomas, Grancic, Branislav, Mikula, Marian, Haidry, Ali Azhar, Gregor, Maros, Satrapinskyy, Leonid, Kus, Peter, Plecenik, Andrej
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Volume:
605
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.605.487
Date:
April, 2014
File:
PDF, 623 KB
english, 2014
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