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Development of High Growth Rate SiC Epi-Reactor with Controlled Thermal Gradient
Ito, M., Tsuchida, Hidekazu, Kamata, Isaho, Storasta, L.Volume:
556-557
Year:
2007
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.556-557.81
File:
PDF, 472 KB
english, 2007