Deformation Mode Construction Using Photoresist...

Key Engineering Materials 2010 / 9 Vol. 447-448

Deformation Mode Construction Using Photoresist Microstructure Devices Produced with Nanoindention Technology

Weng, Yung Jin, Weng, Yung Chun, Liu, Hsu Kang, Chiu, Lin Hsiung
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Volume:
447-448
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.447-448.539
Date:
September, 2010
File:
PDF, 461 KB
english, 2010
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