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Highly Anisotropic and Corrosionless PtMn Etching Using Pulse-Time-Modulated Chlorine Plasma
Samukawa, Seiji, Kumagai, Shinya, Shiraiwa, ToshiakiVolume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.42.l1272
Date:
October, 2003
File:
PDF, 111 KB
english, 2003