Highly Reliable Nickel Silicide Formation with a Zr Capping...

Electrochemical and Solid-State Letters 2003 Vol. 6; Iss. 5

Highly Reliable Nickel Silicide Formation with a Zr Capping Layer

Lee, Tsung Lin, Lee, Jam Wem, Lee, Mei Chi, Lei, Tan Fu, Lee, Chung Len
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Volume:
6
Year:
2003
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1563093
File:
PDF, 220 KB
english, 2003
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