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Electrical Characteristics of DLC Deposited by RF Inductively Coupled Plasma Process
Paosawatyanyong, Boonchoat, Muakngam, A., Thitianan, S.Volume:
93-94
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.93-94.699
Date:
January, 2010
File:
PDF, 449 KB
english, 2010