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Effects of H[sub 2]O[sub 2] on Electrochemical Characteristics of Silicon Wafers during Chemical Mechanical Polishing
Song, Xiaolan, Yang, Haiping, Zhang, Xiaowei, Liu, Hongyan, Qiu, Guanzhou, Tang, MotangVolume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2969417
File:
PDF, 467 KB
english, 2008