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In situ boron-doped LPCVD polysilicon with low tensile stress for MEMS applications
Mari Ylönen, Altti Torkkeli, Hannu KattelusVolume:
109
Year:
2003
Language:
english
Pages:
9
DOI:
10.1016/j.sna.2003.09.017
File:
PDF, 340 KB
english, 2003