Etch rates and morphology of silicon (h k l) surfaces etched in KOH and KOH saturated with isopropanol solutions
I. Zubel, M. KramkowskaVolume:
115
Year:
2004
Language:
english
Pages:
8
DOI:
10.1016/j.sna.2003.11.010
File:
PDF, 717 KB
english, 2004