Effect of NH3 Post-Oxidation Annealing on Flatness of SiO2/SiC Interface
Soejima, Narumasa, Kimura, Taishi, Ishikawa, Tsuyoshi, Sugiyama, TakahideVolume:
740-742
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.740-742.723
Date:
January, 2013
File:
PDF, 1.75 MB
english, 2013