Modifying residual stress and stress gradient in LPCVD...

Sensors and Actuators A: Physical 2006 Vol. 130-131; Iss. none

Modifying residual stress and stress gradient in LPCVD Si3N4 film with ion implantation

Wendian Shi, Haixia Zhang, Guobing Zhang, Zhihong Li
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Volume:
130-131
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.sna.2005.10.008
File:
PDF, 511 KB
english, 2006
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