Improved inclined multi-lithography using water as exposure...

Sensors and Actuators A: Physical 2006 Vol. 128; Iss. 1

Improved inclined multi-lithography using water as exposure medium and its 3D mixing microchannel application

Hironobu Sato, Daisuke Yagyu, Seiki Ito, Shuichi Shoji
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Volume:
128
Year:
2006
Language:
english
Pages:
8
DOI:
10.1016/j.sna.2005.12.043
File:
PDF, 832 KB
english, 2006
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