Current-induced recrystallization of polycrystalline...

Current-induced recrystallization of polycrystalline silicon nano thin films deposited at different temperatures and its influences on piezoresistive sensitivity and temperature coefficients

Chang-zhi Shi, Xiao-wei Liu, Rong-yan Chuai
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Volume:
162
Year:
2010
Language:
english
Pages:
7
DOI:
10.1016/j.sna.2010.02.004
File:
PDF, 706 KB
english, 2010
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