A wafer-scale etching technique for high aspect ratio implantable MEMS structures
R. Bhandari, S. Negi, L. Rieth, F. SolzbacherVolume:
162
Year:
2010
Language:
english
Pages:
7
DOI:
10.1016/j.sna.2010.06.011
File:
PDF, 1.01 MB
english, 2010