Formation of ultra-smooth 45° micromirror on...

Formation of ultra-smooth 45° micromirror on (1 0 0) silicon with low concentration TMAH and surfactant: Techniques for enlarging the truly 45° portion

Yi Wei Xu, Aron Michael, Chee Yee Kwok
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Volume:
166
Year:
2011
Language:
english
Pages:
8
DOI:
10.1016/j.sna.2010.12.018
File:
PDF, 1.42 MB
english, 2011
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