Degradation of 248 nm Deep UV Photoresist by Ion...

Journal of The Electrochemical Society 2011 Vol. 158; Iss. 8

Degradation of 248 nm Deep UV Photoresist by Ion Implantation

Tsvetanova, D., Vos, R., Vereecke, G., Parac-Vogt, T. N., Clemente, F., Vanstreels, K., Radisic, D., Conard, T., Franquet, A., Jivanescu, M., Nguyen, D. A. P., Stesmans, A., Brijs, B., Mertens, P., He
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Volume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3597176
File:
PDF, 2.58 MB
english, 2011
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