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A Less Damaging Patterning Regime for a Successful Integration of Ultra Low-k Materials in Modern Nanoelectronic Devices
Zimmermann, Sven, Ahner, Nicole, Fischer, Tobias, Schaller, Matthias, Schulz, Stefan E., Gessner, ThomasVolume:
1335
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2011.1240
Date:
January, 2011
File:
PDF, 662 KB
english, 2011