High rate deposition of cluster-suppressed amorphous...

MRS Proceedings 2009 / 1 Vol. 1210

High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD

Koga, Kazunori, Sato, Hiroshi, Kawashima, Yuuki, Nakamura, William Makoto, Shiratani, Masaharu
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Volume:
1210
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1210-Q07-10
Date:
January, 2009
File:
PDF, 115 KB
english, 2009
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