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Wet Chemical Etching of InP for Cleaning Applications: II. Oxide Removal
van Dorp, D. H., Cuypers, D., Arnauts, S., Moussa, A., Rodriguez, L., De Gendt, S.Volume:
2
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.025304jss
Date:
February, 2013
File:
PDF, 1.25 MB
english, 2013