Resin filling of UV-cured nanoimprints using...

Microelectronic Engineering 2015 / 03 Vol. 136

Resin filling of UV-cured nanoimprints using pentafluoropropane to fabricate large patterns with a thin residual layer

Wang, Qing, Hiroshima, Hiroshi, Suzuki, Kenta, Youn, Sung-Won
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Volume:
136
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.04.002
Date:
March, 2015
File:
PDF, 1.55 MB
english, 2015
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