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Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension
Veliadis, Victor, Snook, M., Hearne, H., Nechay, B., Woodruff, S., Lavoie, C., Kirby, C., Imhoff, Eugene, White, J., Davis, Stuart M.Volume:
740-742
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.740-742.855
Date:
January, 2013
File:
PDF, 614 KB
english, 2013