Localized Silicon Nanocrystals Fabricated by Stencil Masked Low Energy Ion Implantation: Effect of the Stencil Aperture Size on the Implanted Dose
Diaz, Regis, Dumas, Carine, Grisolia, Jeremie, Ondarçuhu, Thierry, Schamm, Sylvie, Arbouet, Arnaud, Paillard, Vincent, BenAssayag, Gerard, Normand, Pascal, Brugger, JuergenVolume:
1160
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1160-H04-05
Date:
January, 2009
File:
PDF, 273 KB
english, 2009