Atomic Vapour Deposition (AVD™) Process for High...

MRS Proceedings 2004 / 1 Vol. 811

Atomic Vapour Deposition (AVD™) Process for High Performance HfO22 Dielectric Layers

Cosnier, V., Dabertrand, K., Blonkowski, S., Lhostis, S., Zoll, S., Morand, Y., Descombes, S., Guillaumot, B., Hobbs, C., Rochat, N., Rolland, G., Renault, O., Garros, X., Cassé, M., Mitard, J., Lehne
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Volume:
811
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-811-D9.8
Date:
January, 2004
File:
PDF, 146 KB
english, 2004
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