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[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - ALD Options for Si-integrated Ultrahigh-density Decoupling Capacitors in Pore and Trench Designs
Roozeboom, F., Klootwijk, Johan, Verhoeven, Jan, van den Heuvel, Eric, Dekkers, Wouter, Heil, Stephan, van Hemmen, Hans, van de Sanden, Richard, Kessels, Erwin, Le Cornec, F, Guiraud, L, Chevrie, D, BVolume:
3
Year:
2007
Language:
english
DOI:
10.1149/1.2721486
File:
PDF, 1.10 MB
english, 2007