Aluminum Doping by Low-Temperature Homoepitaxial Growth for...

Aluminum Doping by Low-Temperature Homoepitaxial Growth for Ni Ohmic Contacts to p-Type 4H-SiC

Krishnan, Bharat, Kotamraju, Siva Prasad, Melnychuk, Galyna, Merrett, Neil, Koshka, Yaroslav
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Volume:
615-617
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.615-617.581
File:
PDF, 946 KB
english, 2009
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