Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1999 Vol. 17; Iss. 6
Electron beam lithography process for T- and Γ-shaped gate fabrication using chemically amplified DUV resists and PMMA
Chen, Y., Macintyre, D., Thoms, S.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.591119
File:
PDF, 794 KB
english, 1999