Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization
B. Strahm, A.A. Howling, L. Sansonnens, Ch. Hollenstein, U. Kroll, J. Meier, Ch. Ellert, L. Feitknecht, C. BallifVolume:
91
Year:
2007
Language:
english
Pages:
8
DOI:
10.1016/j.solmat.2006.10.024
File:
PDF, 402 KB
english, 2007