High power pulsed magnetron sputtering: A method to...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2015 / 05 Vol. 33; Iss. 3

High power pulsed magnetron sputtering: A method to increase deposition rate

Raman, Priya, Shchelkanov, Ivan A., McLain, Jake, Ruzic, David N
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4916108
Date:
May, 2015
File:
PDF, 4.28 MB
english, 2015
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