Plasma-enhanced chemical vapour-deposited silicon nitride...

Solar Energy Materials and Solar Cells 2008 Vol. 92; Iss. 9

Plasma-enhanced chemical vapour-deposited silicon nitride films; The effect of annealing on optical properties and etch rates

Daniel N. Wright, Erik S. Marstein, Atle Rognmo, Arve Holt
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Volume:
92
Year:
2008
Language:
english
Pages:
8
DOI:
10.1016/j.solmat.2008.03.013
File:
PDF, 296 KB
english, 2008
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