Effect Analysis of Ar-N2 Flow Rates on ZrNX Film by Pulsed...

Advanced Materials Research 2011 / 2 Vol. 194-196

Effect Analysis of Ar-N2 Flow Rates on ZrNX Film by Pulsed Magnetron Sputtering Using Design of Experimental Method

Wen, Hung Jiun, Wen, Fu Hliang, Chang, Kuo Hwa, Wen, C.H., Lo, Yu Lin
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Volume:
194-196
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.194-196.2491
Date:
February, 2011
File:
PDF, 1011 KB
english, 2011
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