Preparation of ZnO thin films using MOCVD technique with...

Preparation of ZnO thin films using MOCVD technique with D2O/H2O gas mixture for use as TCO in silicon-based thin film solar cells

Aswin Hongsingthong, Ihsanul Afdi Yunaz, Shinsuke Miyajima, Makoto Konagai
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Volume:
95
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.solmat.2010.04.025
File:
PDF, 594 KB
english, 2011
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