Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2005 Vol. 23; Iss. 6
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Effects of etch barrier densification on step and flash imprint lithography
Johnson, S., Burns, R., Kim, E. K., Dickey, M., Schmid, G., Meiring, J., Burns, S., Willson, C. G., Convey, D., Wei, Y., Fejes, P., Gehoski, K., Mancini, D., Nordquist, K., Dauksher, W. J., Resnick, DVolume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2102971
File:
PDF, 1.37 MB
english, 2005