Plasma etch removal of poly(methyl methacrylate) in block...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2008 Vol. 26; Iss. 5

Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography

Ting, Yuk-Hong, Park, Sang-Min, Liu, Chi-Chun, Liu, Xiaosong, Himpsel, F. J., Nealey, Paul F., Wendt, Amy E.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
26
Year:
2008
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2966433
File:
PDF, 798 KB
english, 2008
Conversion to is in progress
Conversion to is failed